2025³â 09¿ù 06ÀÏ Åä¿äÀÏ
 
 
  ÇöÀçÀ§Ä¡ > ´º½ºÁö´åÄÄ > Science & Technology

·£¼¶¿þ¾îºÎÅÍ µÅÁöµµ»ì±îÁö... ³ë·ÃÇØÁø »ç±âÇà°¢

 

Á¤Ä¡

 

°æÁ¦

 

»çȸ

 

»ýȰ

 

¹®È­

 

±¹Á¦

 

°úÇбâ¼ú

 

¿¬¿¹

 

½ºÆ÷Ã÷

 

ÀÚµ¿Â÷

 

ºÎµ¿»ê

 

°æ¿µ

 

¿µ¾÷

 

¹Ìµð¾î

 

½Å»óǰ

 

±³À°

 

ÇÐȸ

 

½Å°£

 

°øÁö»çÇ×

 

Ä®·³

 

Ä·ÆäÀÎ
Çѻ츲 ¡®¿ì¸®´Â ÇѽҸ²¡¯ ½Ò ¼Òºñ Ä·ÆäÀÎ ½Ã...
1000¸¸¿øÂ¥¸® Àΰø¿Í¿ì, °Ç°­º¸Çè Áö¿ø ¡®Æò...
- - - - - - -
 

Samsung Announces Mass Production of 2nd Generation 14-Nanometer FinFET Logic Process Technology

Samsung¡¯s current 14-nanometer process brings unparalleled performance and power efficiency improvements
´º½ºÀÏÀÚ: 2016-01-14

Seoul, Korea – January 14, 2016 Samsung Electronics Co. Ltd., a world leader in advanced semiconductor technology, today announced that it has begun mass production of advanced logic chips utilizing its 14nm LPP(Low-Power Plus) process, the 2nd generation of the company’s 14nm FinFET process technology.

In leading mass production of advanced FinFET logic process, Samsung announced in Q1 of 2015 the launch of the Exynos 7 Octa processor built on the industry’s first 14nm LPE (Low-Power Early) process. With the new 14nm LPP process, Samsung continues to demonstrate its process technology leadership, and unparalleled performance and power efficiency for its Exynos 8 Octa processor and its many foundry customers including Qualcomm Technologies, Inc.. The Qualcomm® Snapdragon™ 820 processor uses Samsung’s new 14nm LPP process and is expected to be in devices in the first half of this year.

"We are pleased to start production of our industry-leading, 2nd generation 14nm FinFET process technology that delivers the highest level of performance and power efficiency” said Charlie Bae, Executive Vice President of Sales & Marketing, System LSI Business, Samsung Electronics. "Samsung will continue to offer derivative processes of its advanced 14nm FinFET technology to maintain our technology leadership."

 

Incorporating three-dimensional (3D) FinFET structure on transistors enables significant performance boost and low power consumption. Samsung’s new 14nm LPP process delivers up to 15 percent higher speed and 15 percent less power consumption over the previous 14nm LPE process through improvements in transistor structure and process optimization. In addition, use of fully-depleted FinFET transistors brings enhanced manufacturing capabilities to overcome scaling limitations.

 

With its superb characteristics, 14nm FinFET process is considered to be one of the most optimized solutions for mobile and IoT applications and is expected to meet growing market demand for a wide range of high performance and power efficient applications from network to automotive.



 Àüü´º½º¸ñ·ÏÀ¸·Î

Kioxia Sampling UFS Ver. 4.1 Embedded Flash Memory Devices
Board Achieves Microsoft Solutions Partner Designation with Azure Certified Software for its Enterprise Planning Platform
IQM to Integrate Quantum Computer Into Oak Ridge National Laboratory¡¯s HPC Systems
LG Expands AI Infrastructure Footprint Across Asia
Omdia: China Hyperscalers Commercialize AI Amid Export Restrictions but Modern GPUs Remain Limited
Rigaku Announces STAvesta, a Thermal Analyzer Tailor-made for Next-generation Material Development
Toshiba Releases Automotive Photorelay in a Small Package that Achieves Output Withstand Voltage of 1500V for Automotive Battery Systems

 

KnowBe4 Unveils Brand Refresh to Celebrate 15 Years of Delivering Huma...
Melaka¡¯s Graphytoon Brings Kids Drawings to Life — AI Transform...
webOS: Powering Our Next Growth Chapter Open share list
D-Wave Announces First-Ever Qubits Japan 2025 Quantum Computing User C...
LambdaTest Unveils Media Injection for Real Device Testing
The World's First Drone Soccer World Cup Kicks Off in Jeonju This Sept...
SES and the Luxembourg Government to Develop and Launch New Defence Sa...

 


°øÁö»çÇ×
´º½ºÁö ÇÑÀÚ Ç¥±â¿¡ ´ë¸¸½Ä À½Â÷ Ç¥±â '纽ÞÙó¢ ´Ï¿ì½ÃÁö' º´±â
º£³×ÇÁ·Ò º£³×ÀÎÅõ Áß¹® Ç¥±â 宝Ò¬ÜØÙÌ 宝Ò¬ì×öõ(ÜÄÒ¬ÜØÙÌ ÜÄ...
¹Ìµð¾î¾Æ¿ì¾î Mediaour ØÚ体ä²们 ØÚô÷ä²Ùú MO ¿¥¿À ØÚä² ØÚä²
¾Ë¸®¿ìºê Alliuv ä¹备: ä¹联êó备, ¾Ë¶ã Althle ä¹÷åìÌ
¾Ë¸®¾Ë Allial Áß¹® Ç¥±â ä¹××尔 ä¹××ì³
´ºÆÛ½ºÆ® New1st Áß¹® Ç¥±â 纽ììãæ(¹øÃ¼ Òïììãæ), N1 纽1
¿£ÄÚ½º¸ð½º : À̾¾ 'EnCosmos : EC' Áß¹® Ç¥±â ì¤ñµ
¾ÆÀ̵ð¾î·Ð Idearon Áß¹® Ç¥±â ì¤îè论 ì¤îèÖå
¹ÙÀÌ¿ÀÀÌ´Ï Bioini Áß¹® Ç¥±â ù±药研 ù±å·æÚ
¿À½ºÇÁ·Ò Ausfrom 奥ÞÙÜØÙÌ, À£ÇÁ·Ò Welfrom 卫ÜØÙÌ
¿¡³ÊÇÁ·Ò Enerfrom 额ÒöÜØÙÌ ¿¡³ÊÀ¯ºñ Eneruv 额Òöêó备
¾ËÇÁ·Ò Alfrom Áß¹® Ç¥±â ä¹尔ÜØÙÌ ä¹ì³ÜØÙÌ

 

ȸ»ç¼Ò°³ | ÀÎÀçä¿ë | ÀÌ¿ë¾à°ü | °³ÀÎÁ¤º¸Ãë±Þ¹æÄ§ | û¼Ò³âº¸È£Á¤Ã¥ | Ã¥ÀÓÇѰè¿Í ¹ýÀû°íÁö | À̸ÞÀÏÁÖ¼Ò¹«´Ü¼öÁý°ÅºÎ | °í°´¼¾ÅÍ

±â»çÁ¦º¸ À̸ÞÀÏ news@newsji.com, ÀüÈ­ 050 2222 0002, ÆÑ½º 050 2222 0111, ÁÖ¼Ò : ¼­¿ï ±¸·Î±¸ °¡¸¶»ê·Î 27±æ 60 1-37È£

ÀÎÅͳݴº½º¼­ºñ½º»ç¾÷µî·Ï : ¼­¿ï ÀÚ00447, µî·ÏÀÏÀÚ : 2013.12.23., ´º½º¹è¿­ ¹× û¼Ò³âº¸È£ÀÇ Ã¥ÀÓ : ´ëÇ¥ CEO

Copyright ¨Ï All rights reserved..